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Blank Mask 김성윤 팀장 shem.kim@sk.com

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HOME Semiconductor Blank Mask

Blank Mask

A core part of the semiconductor lithography process

A blank mask is a core part of a photomask used in the semiconductor lithography process. A blank mask and a photomask can be compared to a film before/after taking a photo, respectively. As semiconductor technology develops, a high-definition photomask is required to form fine patterns, along with a blank mask that can support it. We are committed to developing a high-end blank mask entirely with our own technology and expertise.

Cases of application

20200812194956732033.jpg Usage of photomask for semiconductors

Usage

Formation of photomask patterns

Major products

Major products
Major products Features
Phase shift mask Improving the level of definition by forming a photomask pattern with the functional film

Packing unit

Supplied in specially made logistics boxes