|Blank Mask||김성윤 팀장firstname.lastname@example.org|
A blank mask is a core part of a photomask used in the semiconductor lithography process. A blank mask and a photomask can be compared to a film before/after taking a photo, respectively. As semiconductor technology develops, a high-definition photomask is required to form fine patterns, along with a blank mask that can support it. We are committed to developing a high-end blank mask entirely with our own technology and expertise.
|Phase shift mask||Improving the level of definition by forming a photomask pattern with the functional film|