Item | Name | Tel | |
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Blank Mask | 김성윤 팀장 | shem.kim@sk.com |
A blank mask is a core part of a photomask used in the semiconductor lithography process. A blank mask and a photomask can be compared to a film before/after taking a photo, respectively. As semiconductor technology develops, a high-definition photomask is required to form fine patterns, along with a blank mask that can support it. We are committed to developing a high-end blank mask entirely with our own technology and expertise.
Major products | Features |
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Phase shift mask | Improving the level of definition by forming a photomask pattern with the functional film |